发明名称 NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 PURPOSE: A nonvolatile memory device and a manufacturing method thereof are provided to improve integration by forming a floating gate electrode with metal-semiconductor compounds. CONSTITUTION: A channel layer (190) vertically protrudes from a substrate. A tunnel insulating layer (180) surrounds the side of the channel layer. A plurality of interlayer dielectric layers and a plurality of control gate electrodes are alternatively laminated along the channel layer. A floating gate electrode (150) includes metal-semiconductor compounds. A charge blocking layer is interposed between the control gate electrode and the floating gate electrode.
申请公布号 KR20130113212(A) 申请公布日期 2013.10.15
申请号 KR20120035610 申请日期 2012.04.05
申请人 SK HYNIX INC. 发明人 WHANG, SUNG JIN;SHEEN, DONG SUN;PYI, SEUNG HO;KIM, MIN SOO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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