发明名称 |
NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME |
摘要 |
PURPOSE: A nonvolatile memory device and a manufacturing method thereof are provided to improve integration by forming a floating gate electrode with metal-semiconductor compounds. CONSTITUTION: A channel layer (190) vertically protrudes from a substrate. A tunnel insulating layer (180) surrounds the side of the channel layer. A plurality of interlayer dielectric layers and a plurality of control gate electrodes are alternatively laminated along the channel layer. A floating gate electrode (150) includes metal-semiconductor compounds. A charge blocking layer is interposed between the control gate electrode and the floating gate electrode. |
申请公布号 |
KR20130113212(A) |
申请公布日期 |
2013.10.15 |
申请号 |
KR20120035610 |
申请日期 |
2012.04.05 |
申请人 |
SK HYNIX INC. |
发明人 |
WHANG, SUNG JIN;SHEEN, DONG SUN;PYI, SEUNG HO;KIM, MIN SOO |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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