发明名称 NEUTRON GENERATING SOURCE
摘要 <p>The aim of the present invention is to provide a neutron source which forms high-density plasma near a target and prevents the surface of the target from being overheated, to thus generate neutrons with high flux. To this end, a magnetic field is formed in the vicinity of the target, and plasma is generated in the space in which the magnetic field is formed, to thereby form high-density plasma near the target and enable neutrons to be discharged with high flux from the target. Further, plasma is generated in pulses and a target voltage is also applied in pulses to prevent the surface of the target from being overheated. For the target in which adsorption elements are exhausted during reaction, a target bias voltage is adjusted to enable re-adsorption and thus to proceed with the process. Further, the neutron source of the present invention enables the shape of the target to be freely transformed into a flat shape, a cylindrical shape, a linear shape, or the like such that a target that is large, portable, etc. can be utilized in various applications. An empty target can be provided to achieve the improved efficiency of the thermonuclear reaction and the reutilization of the target.</p>
申请公布号 CA2868796(A1) 申请公布日期 2013.10.10
申请号 CA20132868796 申请日期 2013.04.01
申请人 KOREA BASIC SCIENCE INSTITUTE 发明人 YOO, SUK JAE;KIM, SEONG BONG;YOON, JUNG-SIK
分类号 G21G4/02;G21K7/00 主分类号 G21G4/02
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