| 摘要 |
PROBLEM TO BE SOLVED: To provide a laser annealing device and a laser annealing method, capable of improving utilization efficiency of laser energy and efficiently performing anneal processing.SOLUTION: A laser annealing device for irradiating an amorphous silicon film 5 with a laser beam and performing anneal processing comprises: a first pulse laser 6 which generates a first laser beam Lof a constant wavelength having a constant pulse width; a second pulse laser 7 which generates a second laser beam Lhaving a longer pulse width and wavelength than the first laser light L; synthesizing means 8 for synthesizing the first laser beam Land the second laser beam Linto the same optical axis; and control means 3 for controlling a generation timing of the first laser beam Land the second laser beam Lby the action on the first pulse laser 6 and the second pulse laser 7. The control means 3 controls the first pulse laser 6 so that the first laser light Lis generated at a predetermined timing within a pulse width of the second laser beam L. |
