发明名称 ION BEAM MEASURING DEVICE, ION BEAM MEASURING METHOD, AND ION IMPLANTATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide contactless ion beam measurement.SOLUTION: An ion beam measuring device 10 includes an irradiation portion 20 which irradiates an ion beam 11 with a measurement electromagnetic wave 12, and a detection portion 30 which detects a scattered electromagnetic wave generated by elastic scattering of the measurement electromagnetic wave 12 by charged particles in the ion beam 11. The measurement electromagnetic wave 12 may be made incident obliquely on the ion beam 11. The elastic scattering of the measurement electromagnetic wave 12 may include Rayleigh scattering or Thomson scattering.
申请公布号 JP2013211177(A) 申请公布日期 2013.10.10
申请号 JP20120081032 申请日期 2012.03.30
申请人 SUMITOMO HEAVY IND LTD 发明人 TAKAHASHI NOBUAKI
分类号 H01J37/04;H01J37/244;H01J37/317 主分类号 H01J37/04
代理机构 代理人
主权项
地址