发明名称 PROTECTIVE FLUORINE-DOPED SILICON OXIDE FILM FOR OPTICAL COMPONENTS
摘要 <p>An optical component includes a substrate and a fluorine-doped thin film formed on the substrate. This fluorine-doped thin film is dense, and thus very low absorbing and insensitive to various vacuum, temperature, and humidity conditions. This dense film has a high refractive index, which remains stable irrespective of environmental conditions. The fluorine-doped thin film can advantageously ensure low scattering, low reflectance, and high transmittance. Moreover, the fluorine-doped thin film is damage resistant to incident radiation density. The fluorine-doped thin film may be a fluorine-doped silicon oxide film having a thickness of approximately 1-lOnm and a fluorine concentration of 0.1% to 5%.</p>
申请公布号 WO2013152031(A1) 申请公布日期 2013.10.10
申请号 WO2013US35009 申请日期 2013.04.02
申请人 KLA-TENCOR CORPORATION 发明人 DELGADO, GILDARDO
分类号 G02B1/11 主分类号 G02B1/11
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