发明名称 ELONGATED BUMPS IN INTEGRATED CIRCUIT DEVICES
摘要 <p>PURPOSE: Elongated bumps in integrated circuit devices are provided to minimize stress in a low-k dielectric layer by optimizing the size of a bump structure. CONSTITUTION: A passivation layer (42) covers the edges of a metal pad (40). The passivation layer includes a first opening part which overlaps with the metal pad. A polymer layer (46) is located on the passivation layer. The polymer layer includes a second opening part which overlaps with the metal pad. A UBM (48) includes a first part which is located in the second opening part and a second part which is located on a part of the polymer layer.</p>
申请公布号 KR20130111265(A) 申请公布日期 2013.10.10
申请号 KR20130011156 申请日期 2013.01.31
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN YEN LIANG;CHEN CHEN SHIEN;KUO TIN HAO;WU SHENG YU;LIN TSUNG SHU;HUANG CHANG CHIA
分类号 H01L21/60 主分类号 H01L21/60
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