ATMOSPHERIC-PRESSURE PLASMA FREE RADICAL CLEANING SYSTEM

摘要

An atmospheric-pressure plasma free radical cleaning system comprises a medium-frequency plasma generator (107), a radio-frequency plasma generator (104), a suction slice device (110), a power source system, a movable mechanical arm (111), an air inlet system (101) and an air exhausting pump (112). The system uses one medium-frequency plasma generator and one radio-frequency plasma generator simultaneously as plasma sources. The working gases respectively enter the two plasma generators under the control of a flowmeter. The suction slice device is fixed to the one-dimensional movable mechanical arm. After a power source is connected, the two plasma generators upwards spout free radical beams. The suction slice device adsorbs a silicon slice, and sweeps over the spouts of the plasma generators under the drive of the mechanical arm to perform degumming cleaning on the silicon slice. The distance between the spouts of the two plasma generators is 0.5-2.5 mm. The system can be applied to clean photoresists and organic pollutants on silicon slices or clean organic pollutants on other substrate surfaces.