METHOD AND APPARATUS FOR FORMING FEATURES WITH PLASMA PRE-ETCH TREATMENT ON PHOTORESIST

摘要

A method for forming features through a photoresist mask into an underlying layer is provided. The photoresist mask has patterned mask features. The photoresist mask has patterned mask features. A treatment gas containing H2 and N2 is provided. A plasma is generated from the treatment gas, and the photoresist mask is exposed to the plasma. The treatment gas is stopped, and then the features are etched into the underlying layer through the plasma-treated photoresist mask.