| 摘要 |
PROBLEM TO BE SOLVED: To provide an interferometer and method for measuring characteristics of optically unprocessed surface features.SOLUTION: Disclosed is an interferometry analysis method that includes: comparing information derivable from multiple interferometry signals corresponding to different surface locations of a test object with information corresponding to multiple models of the test object, where the multiple models are parameterized by a series of characteristics that relate to one or more under-resolved lateral features of the test object; and outputting information about the under-resolved surface feature on the basis of the comparison. |
