发明名称 |
PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR |
摘要 |
<p>PURPOSE: A projection exposure apparatus including at least one manipulator is provided to secure a correct imaging by including a projection lens with a small wavefront aberration. CONSTITUTION: A projection lens (22) has a plurality of optical elements. The optical elements are formed for imaging a mask structure on a substrate. At least one manipulator changes at least one optical effect among the optical elements. An algorithm generator (42) generates an optimization algorithm (52) for producing a travel. A travel establishing device (44) establishes at least one travel.</p> |
申请公布号 |
KR20130111364(A) |
申请公布日期 |
2013.10.10 |
申请号 |
KR20130032114 |
申请日期 |
2013.03.26 |
申请人 |
CARL ZEISS SMT GMBH |
发明人 |
BITTNER BORIS;WABRA NORBERT;HODENBERG MARTIN VON |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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