发明名称 PROJECTION EXPOSURE APPARATUS WITH AT LEAST ONE MANIPULATOR
摘要 <p>PURPOSE: A projection exposure apparatus including at least one manipulator is provided to secure a correct imaging by including a projection lens with a small wavefront aberration. CONSTITUTION: A projection lens (22) has a plurality of optical elements. The optical elements are formed for imaging a mask structure on a substrate. At least one manipulator changes at least one optical effect among the optical elements. An algorithm generator (42) generates an optimization algorithm (52) for producing a travel. A travel establishing device (44) establishes at least one travel.</p>
申请公布号 KR20130111364(A) 申请公布日期 2013.10.10
申请号 KR20130032114 申请日期 2013.03.26
申请人 CARL ZEISS SMT GMBH 发明人 BITTNER BORIS;WABRA NORBERT;HODENBERG MARTIN VON
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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