发明名称 |
Photomask-forming glass substrate and making method |
摘要 |
A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 mum.
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申请公布号 |
US8551346(B2) |
申请公布日期 |
2013.10.08 |
申请号 |
US20100964762 |
申请日期 |
2010.12.10 |
申请人 |
HARADA DAIJITSU;MORIKAWA MAMORU;TAKEUCHI MASAKI;SHIBANO YUKIO;SHIN-ETSU CHEMCIAL CO., LTD. |
发明人 |
HARADA DAIJITSU;MORIKAWA MAMORU;TAKEUCHI MASAKI;SHIBANO YUKIO |
分类号 |
G03F1/00;C03C15/00;C03C15/02;C03C19/00;G03F1/60 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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