发明名称 Method of manufacturing liquid discharge head substrate and method of processing the substrate
摘要 A method of processing a liquid discharge head substrate includes the step of providing a recessed portion in the back surface of the substrate by discharging a manufacturing liquid in a linear trajectory to the back surface of the substrate and by irradiating the back surface of the substrate with laser light that passes along and in the manufacturing liquid.
申请公布号 US8549750(B2) 申请公布日期 2013.10.08
申请号 US20090990093 申请日期 2009.06.17
申请人 KATO MASATAKA;KISHIMOTO KEISUKE;CANON KABUSHIKI KAISHA 发明人 KATO MASATAKA;KISHIMOTO KEISUKE
分类号 B21D53/76;B23P17/00;B41J2/145;B41J2/15 主分类号 B21D53/76
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