| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device in which the lower surface of a substrate can be cleaned while keeping the upper surface of the substrate clean and protecting the substrate against damage, and to provide a substrate processing apparatus.SOLUTION: A rotating shaft 210 is provided to extend downward from the inside of a spin motor 200. A plate support member 510 is attached to the lower end of the rotating shaft 210. A spin plate 520 is supported horizontally by means of the plate support member 510. A substrate holding mechanism 700 is provided at the periphery of the spin plate 520. An annular member 525 is attached to the lower surface 520u of the spin plate 520. Lower end 525c of the annular member 525 is formed to face an annular region R1 along the outer peripheral edge on the upper surface of the substrate W held by a spin chuck 600. The interval G2 of the upper surface of the substrate W and the lower surface 520u of the spin plate 520 is larger than the interval G1 of the upper surface of the substrate W and the lower end 525c of the annular member 525. |
