| 摘要 |
PROBLEM TO BE SOLVED: To correct a reduction in dosage caused by a PD in the exposure of a resist film consisting of a chemical amplification type resist more easily than in conventional technology.SOLUTION: In an exposure method for having a resist film 11 consisting of a chemical amplification type resist exposed to light by an exposure beam EB, a first round of exposure scan is executed with a designated irradiation dosage for each of designated exposure regions B1 to B16 of the resist film 11, in which if a path on which the first round of exposure scan was executed is assumed to be an outward path 80, then the second and subsequent rounds of exposure scan are executed while maintaining the irradiation dosage so that there will be the same number of outward paths 80 and return paths 81 on the whole. |
