| 摘要 |
The invention provides a prediction system and method for film yield, which are used for detecting defects generated during the manufacture of optical films to calculate the predicted yield of products. The prediction system for the film yield comprises a first inspection part which is used for detecting the defects on the optical films in executing a specific step of the manufacturing process of the optical films and generating a first defect data comprising the positions of the detected defects; a second inspection part which is used for detecting the defects on the optical films in executing steps different from the specific step and generating a second defect data comprising the position of the detected defects; a data consolidation part which consolidates the first defect data and a second defect data; and a yield prediction system which is used for calculating the predicted yield of the optical films based on a predicted cutting positions and cutting sizes of the optical films according to the defect data obtained by the consolidation of the data consolidation part. |
