SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF THE SAME, DISPLAY DEVICE AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device which prevents immersion of moisture into an oxide semiconductor film to improve TFT characteristics; and provide a manufacturing method of the semiconductor device, a display device and an electronic apparatus.SOLUTION: A semiconductor device comprises a transistor having an oxide semiconductor film, and an insulation film which covers the oxide semiconductor film and includes a resin material. The insulation film is covered with a surface modification layer which has a hydrophobic property higher than that of the resin material.