发明名称 PLATING METHOD, PLATING SYSTEM, AND STORAGE MEDIUM
摘要 <p>[Problem] Provided is a plating method whereby adhesion to a substrate can be improved. [Solution] This plating method for plating a substrate is provided with: a step of forming a vacuum deposition layer (2A) on a substrate (2) by performing vacuum deposition with respect to the substrate (2); a step of sequentially providing an adhesive layer (21) and a catalyst adsorbing layer (22) on the vacuum deposition layer (2A) on the substrate (2); and a step of forming, on the catalyst adsorbing layer (22) on the substrate (2), a plating layer laminated body (23) having a first plating layer (23a) and a second plating layer (23b), which function as barrier films. The surface of the substrate (2) can be smoothed by means of the vacuum deposition layer (2A), and the vacuum deposition layer (2A) functions as a base layer that improves adhesion.</p>
申请公布号 WO2013145979(A1) 申请公布日期 2013.10.03
申请号 WO2013JP54505 申请日期 2013.02.22
申请人 TOKYO ELECTRON LIMITED 发明人 MIZUTANI NOBUTAKA;TANAKA TAKASHI;INATOMI YUICHIRO;SAITO YUSUKE;IWASHITA MITSUAKI
分类号 C23C28/02;C23C18/18;C23C18/50;H01L21/285;H01L21/288;H01L21/3205;H01L21/768 主分类号 C23C28/02
代理机构 代理人
主权项
地址