发明名称 |
SEMICONDUCTOR DEVICE, NITRIDE SEMICONDUCTOR CRYSTAL, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND NITRIDE SEMICONDUCTOR CRYSTAL MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device having low on-resistance.SOLUTION: A semiconductor device comprises: a nucleation layer formed on a substrate; a buffer layer formed on the nucleation layer; a first nitride semiconductor layer formed on the buffer layer; and a second nitride semiconductor layer formed on the first semiconductor layer. A ratio of yellow luminescence emission to band end emission in photoluminescence is 400% or less, and a twist value in an X-ray rocking curve is 1000 arcsecond or less. |
申请公布号 |
JP2013201398(A) |
申请公布日期 |
2013.10.03 |
申请号 |
JP20120070385 |
申请日期 |
2012.03.26 |
申请人 |
FUJITSU LTD |
发明人 |
NAKAMURA TETSUKAZU;YAMADA ATSUSHI;ISHIGURO TETSURO;MIYAJIMA TOYOO;IMANISHI KENJI |
分类号 |
H01L21/338;H01L21/205;H01L29/778;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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