发明名称 SEMICONDUCTOR DEVICE, NITRIDE SEMICONDUCTOR CRYSTAL, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND NITRIDE SEMICONDUCTOR CRYSTAL MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having low on-resistance.SOLUTION: A semiconductor device comprises: a nucleation layer formed on a substrate; a buffer layer formed on the nucleation layer; a first nitride semiconductor layer formed on the buffer layer; and a second nitride semiconductor layer formed on the first semiconductor layer. A ratio of yellow luminescence emission to band end emission in photoluminescence is 400% or less, and a twist value in an X-ray rocking curve is 1000 arcsecond or less.
申请公布号 JP2013201398(A) 申请公布日期 2013.10.03
申请号 JP20120070385 申请日期 2012.03.26
申请人 FUJITSU LTD 发明人 NAKAMURA TETSUKAZU;YAMADA ATSUSHI;ISHIGURO TETSURO;MIYAJIMA TOYOO;IMANISHI KENJI
分类号 H01L21/338;H01L21/205;H01L29/778;H01L29/812 主分类号 H01L21/338
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