| 摘要 |
A substrate treating apparatus is provided which includes a treatment container which provides a space in which a substrate is washed; a substrate support member which is included in the space and supports the substrate; a spray member which selectively sprays a plurality of fluids on the substrate seated on the substrate support member. The treatment container comprises a plurality of recovery containers the entrances of which are stacked in an up-and-down direction to receive a fluid within the space; a first elevation member which moves the plurality of recovery containers in an up-and-down direction; and a second elevation member which relatively moves a part of the plurality of recovery containers in an up-and-down direction with respect to the remaining recovery containers.
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