ADJUSTMENT METHOD OF EXPOSURE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an adjustment method of an exposure apparatus for carrying out a desired exposure operation.SOLUTION: An adjustment method is used for adjusting an immersion exposure apparatus (EX) which includes a holder (2H) holding a substrate (P) and a holder (8H) holding the substrate (P) before the substrate (P) is held by the holder (2H) and exposes the substrate (P) held by the holder (2H) through a liquid body (LQ). The adjustment method includes the steps of: holding a thermometer (30) by the holder (2H); holding the thermometer (30) by the holder (8H); and adjusting at least one of temperatures of the holder (2H) and the holder (8H) on the basis of a detection result of the thermometer (30) held by the holder (2H) and a detection result of the thermometer (30) held by the holder (8H).