| 摘要 |
PROBLEM TO BE SOLVED: To enable patterning for suppression of discharge generation to be performed with high precision even if miniaturization of arrangement of through-holes progresses when a photosensitive glass is used as a plate-like member.SOLUTION: A method for manufacturing an electron amplification substrate provided with a plate-like member 11 comprised of a photosensitive glass comprises: a pattern drawing step of drawing a pattern on a resist film 24 formed on an electrode layer 12; and a pattern forming step of using a resist pattern 26 formed through the pattern drawing and etching to the electrode layer 12 to form a patterning part 16 having a prescribed shape on the electrode layer 12. In the pattern drawing step, the pattern drawing on the resist film 24 is performed by direct application of energy beams 25, and when directly applying the energy beams 25, an application position is determined by reflecting a correction amount based on a deformation amount measurement result of the plate-like member 11. |
