| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound, positive type resist composition and resist pattern forming method using the positive type resist composition. <P>SOLUTION: This polymer compound includes: a constitutional unit (a0) derived from a vinyl compound having 1 to 2 hydroxy groups and 0 to 2 alkyl groups-substituted naphthalene ring at a side chain; a constitutional unit (a1) derived from acrylic ester containing acid-dissociable dissolution-inhibiting radical; a constitutional unit (a2) derived from acrylic ester containing a lactone-containing ring radical; and a constitutional unit (a3) derived from acrylic ester containing a polar group-containing aliphatic hydrocarbon radical. <P>COPYRIGHT: (C)2009,JPO&INPIT |
