发明名称 Semiconductor device and method for manufacturing the same
摘要 An object is, in a thin film transistor in which an oxide semiconductor is used as an active layer, to prevent change in composition, film quality, an interface, or the like of an oxide semiconductor region serving as an active layer, and to stabilize electrical characteristics of the thin film transistor. In a thin film transistor in which a first oxide semiconductor region is used as an active layer, a second oxide semiconductor region having lower electrical conductivity than the first oxide semiconductor region is formed between the first oxide semiconductor region and a protective insulating layer for the thin film transistor, whereby the second oxide semiconductor region serves as a protective layer for the first oxide semiconductor region; thus, change in composition or deterioration in film quality of the first oxide semiconductor region can be prevented, and electrical characteristics of the thin film transistor can be stabilized.
申请公布号 US8546182(B2) 申请公布日期 2013.10.01
申请号 US201213680349 申请日期 2012.11.19
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 AKIMOTO KENGO;SASAKI TOSHINARI;KUWABARA HIDEAKI
分类号 H01L21/00;H01L21/16 主分类号 H01L21/00
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