| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate forming process that is applicable for a microlens array.SOLUTION: A method of forming concave micropattern includes: a step for preparing a first mask 2 having a first opening part and a first closed part corresponding to a micro pattern to be formed, and a second mask 5 having a second opening part and a second closed part which form a reverse pattern of the first opening and closed parts; a first film forming step wherein the surface of a substrate 1 and the first mask are placed away from each other in a vacuum film forming apparatus and a first film forming material is formed into a film in vacuum from a side facing the substrate and the mask; a step for removing the first mask after a recession of a first film forming material layer 4 is formed immediately under the first closed part by the first film forming step; and a step wherein the substrate and the second mask are placed in the vacuum film forming apparatus so that the surface of the substrate and the second mask are away from each other and the second opening part is aligned with the recession of the first film forming material layer, a second film forming material is formed into a film from the side facing the mask and the substrate in the vacuum film forming apparatus, the recession of the first film forming material is filled with the second film forming material, and the second mask is removed. |
