PATTERN MEASURING DEVICE AND SEMICONDUCTOR MEASURING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a pattern measuring device which generates proper reference pattern data while suppressing an increase of a manufacturing cost which is caused by minutely changing a manufacturing condition.SOLUTION: A pattern measuring device includes an arithmetic processing unit that measures a pattern formed on a sample. The arithmetic processing unit obtains or generates image data or contour data of a plurality of circuit patterns which are different in manufacturing conditions of a manufacturing device, on the basis of a signal obtained by a charged particle beam device; and generates reference data used for measuring the circuit patterns from the image data or contour data.