| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition film forming device, capable of obtaining plasma of high uniformity, and forming a deposition film of high uniformity, and to provide a method for manufacturing an electrophotographic photoreceptor using the deposition film forming device.SOLUTION: A cylindrical side wall of a reaction vessel 101 of a deposition film forming device has a plurality of non-electrode parts 116 for making the high frequency power pass from a power supply position to an inner circumferential surface of a cylindrical electrode 106. The power supply position and the plurality of non-electrode parts are arranged so that each shortest distance between the power supply position 117 on the outer circumferential surface of the cylindrical side wall and each of the plurality of non-electrode parts is equal. The shortest distance A is smaller than one smaller in the distance from the power supply position on the outer circumferential surface of the cylindrical side wall to one end of the cylindrical side wall, and the distance from the power supply position to the other end of the cylindrical side wall. When the point closest to the power supply position out of the points on the non-electrode part on the outer circumferential surface of the cylindrical side wall is defined as a closest point P and when the plane passing through the closest point and orthogonal to the generating line of the cylindrical side wall is defined as an imaginary vertical plane, a plurality of imaginary vertical planes are present. |
