发明名称 CATA-DIOPTRIC TYPE PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a relatively compact cata-dioptric type projection optical system that has superior imaging performance having various aberrations such as a chromatic aberration and a field curvature excellently corrected, and can secure a large effective image-side numerical aperture by excellently suppressing reflection loss on an optical plane.SOLUTION: A cata-dioptric type projection optical system which forms a reduced image of a first plane R on a second plane W includes at least two reflecting mirrors CM1, CM2 and transparent members L11-L217, and has an arcuate effective imaging region not including an optical axis AX of the projection optical system; and a condition of 1.05<R/Y<12 is satisfied, where R is the radius of curvature of an arc defining the effective imaging region and Yis a maximum image height on the second plane.
申请公布号 JP2013191871(A) 申请公布日期 2013.09.26
申请号 JP20130101632 申请日期 2013.05.13
申请人 NIKON CORP 发明人 OMURA YASUHIRO
分类号 H01L21/027;G02B13/18;G02B17/08 主分类号 H01L21/027
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