发明名称 METHOD FOR PERFORMING MODEL-BASED LITHOGRAPHY GUIDED LAYOUT DESIGN
摘要 PROBLEM TO BE SOLVED: To provide a method for creating efficient model-based sub-resolution assist features (MB-SRAF).SOLUTION: An SRAF guidance map (SGM) is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade an aerial image over a process window. In one embodiment, the SGM is used to determine SRAF placement rules and/or to finely tune already-placed SRAFs. The SGM is used directly to place SRAFs in a mask layout. Mask layout data including SRAFs is generated, wherein the SRAFs are placed according to the SGM. The SGM comprises an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of SRAF.
申请公布号 JP2013190828(A) 申请公布日期 2013.09.26
申请号 JP20130133377 申请日期 2013.06.26
申请人 ASML NETHERLANDS BV 发明人 YE JUN;CAO YU;FEN HANNING
分类号 G03F1/70;G03F1/00;G03F1/36;G06F17/50;G06T1/00 主分类号 G03F1/70
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