发明名称 PATTERN ILLUMINATION APPARATUS AND DISTANCE MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a small pattern illumination apparatus which can emit a pattern capable of achieving a precise distance measurement, and a distance measuring apparatus which measures a distance to a measurement object by using the pattern illumination apparatus.SOLUTION: A pattern illumination apparatus 1 according to a first embodiment of the present invention, which projects a pattern to a measurement object to measure a distance to the measurement object that is not shown, comprises: a semiconductor laser (light source) 2 that emits light for projecting pattern light 5; a coupling lens (optical means) 3 that converts the light emitted from the semiconductor laser 2 to parallel light; a diffraction optical element 4 that diffracts the parallel light converted by the coupling lens 3. The pattern light 5 emitted from the diffraction optical element 4 and projected to the measurement object is a pattern formed by randomly arranging pixels each having luminance distribution of multi-gradation which is three gradations or more.
申请公布号 JP2013190394(A) 申请公布日期 2013.09.26
申请号 JP20120058661 申请日期 2012.03.15
申请人 RICOH CO LTD 发明人 OUCHIDA SHIGERU
分类号 G01B11/25;G01B11/245;G01C3/06 主分类号 G01B11/25
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