发明名称 |
System and Method for Improved Automated Semiconductor Wafer Manufacturing |
摘要 |
A method for aligning a photolithographic machine in an automated semiconductor manufacturing system is provided. The method may include identifying a maximum precision degree for a wafer and identifying a maximum overlay correction value. The method may simulate one or more algorithms to determine whether an algorithm aligns a leading lot within alignment specifications. The method may align a photolithography machine using an algorithm selected based on the simulations.
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申请公布号 |
US2013253681(A1) |
申请公布日期 |
2013.09.26 |
申请号 |
US201313890975 |
申请日期 |
2013.05.09 |
申请人 |
LTD. TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY,;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HSIEH WEN-YAO;CHIU CHE-YU;PENG ANWEI;CHEN JIAN-HUNG;WU HSUEH-CHEN |
分类号 |
G05B19/02 |
主分类号 |
G05B19/02 |
代理机构 |
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主权项 |
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