| 摘要 |
PROBLEM TO BE SOLVED: To form a target pattern in a shot area on a wafer in high accuracy.SOLUTION: In forming a target pattern in a shot area on a wafer by stitching light patterns generated by a variable shape forming mask, a plurality of templates that specify use areas of the variable shape forming mask are set respectively in a state where an overlapping area partly occurs (step 102 to step 108). On the basis of information concerning setting of each template and information concerning a target pattern, a plurality of modulation elements of the variable shape forming mask are sequentially controlled (step 110). Thereby, it becomes possible to form a target pattern in the shot area of the wafer in high accuracy. |
