PROCESS TREATMENT PART, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD USING PROCESS TREATMENT PART AND SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which uniformly processes substrates.SOLUTION: A substrate processing apparatus of this invention includes: an internal chamber where a first space is formed therein; a first external chamber which encloses the internal chamber and forms a second space separated from the first space; a susceptor which is positioned in the first space and supports a substrate; a first exhaust line which is connected with the internal chamber and exhausts a gas in the first space to the exterior; a process gas supply part supplying a process gas used for processing the substrate to the first space; and a monitor module which is positioned in the second space and monitors the state of the first space.