发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which easily secures the position reproducibility of a temperature sensor and improves the temperature detection accuracy.SOLUTION: A substrate processing apparatus includes: a heater 19; a reaction tube 24 defining a processing chamber 13 where a substrate 16 held by a substrate holder 15 is processed; a temperature sensor 45 having a protection tube 49 which extends upward along an inner surface of the reaction tube and into which a thermo-couple is inserted, the protection tube 49 provided with a first positioning member 54 provided in at least one position so as to protrude toward an inner wall of the reaction tube; and a second positioning member 55 having a fitting groove 56 into which the first positioning member fits. The second positioning member is disposed between the protection tube and the reaction tube with the first positioning member fitting into the fitting groove.
申请公布号 JP2013191695(A) 申请公布日期 2013.09.26
申请号 JP20120056261 申请日期 2012.03.13
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 HAYASHI TAKANORI;SHIMA NOBUHITO
分类号 H01L21/205;C23C16/46;H01L21/22;H01L21/31;H01L21/324 主分类号 H01L21/205
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