UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER COMPRISING BLOCK COPOLYMER

摘要

PURPOSE: An undercoating is provided to manufacture a substrate with a nanostructure in which a location and an alignment are freely designed on the surface of a substrate by using the phase separation of a block copolymer. CONSTITUTION: An undercoating agent is used for separating a layer (3) containing a block copolymer from a substrate (1). The undercoating agent contains a resin component and a structure unit which does not have an aromatic ring or a unit having it. The resin component has a group interacting with a substrate and does not have an ether-containing cyclic group with 3-7 atom rings. A patterning method of a layer containing a block copolymer comprises a step of forming a layer formed of the undercoating agent by spreading the undercoating agent onto the substrate; a step of forming the layer containing the block copolymer in which a plurality of blocks are coupled on the surface of the layer formed of the undercoating agent and phase-separating the block copolymer-containing layer; and a step of selectively removing a phase consisting of at least one kind of block among a plural kinds of blocks forming the block copolymer.