| 摘要 |
Provided are an apparatus for gas scrubbing and a method for gas scrubbing. The apparatus for gas scrubbing includes: a reaction tube through which a reaction gas is flown in; a reactor which is connected to the reaction tube and activates the reaction gas with plasma; and a water injection port which injects water to the plasma in the reactor. It allows a very economical gas scrubbing because water is vaporized using the plasma as heat source, without using an additional heater. In addition, the efficiency of gas scrubbing is also improved because water is directly vaporized at an optimized region where the reaction gas in plasma state is discharged.
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