| 摘要 |
PURPOSE: A generation method, a storage medium, and an information processing apparatus are provided to easily produce data for a mask pattern by using data including a sub pattern. CONSTITUTION: A second evaluation function value is calculated (S1110). A generation condition that a sub pattern is generated is set. A mask pattern is formed in a substrate. An image is calculated by using the mask pattern. Data for the mask pattern is generated by the above-mentioned calculation process (S114). [Reference numerals] (AA) No; (BB) Yes; (CC) End; (S111) Calculate a second evaluation function value; (S112) Number of calculation of the second evaluation function value reaches the predetermined number or the second evaluation function value is within the range of tolerance?; (S113) Change exposure condition, mask parameter value and generation control parameter value; (S114) Generate data for the mask pattern and exposure condition |
