发明名称 |
Method for etching a sacrificial layer for a micro-machined structure |
摘要 |
A method of etching a sacrificial layer for a micro-machined structure, the sacrificial layer positioned between a layer of a first material and a layer of a second material, the etching being carried out by an etching agent. The method includes: providing at least one species having an affinity for the etching agent greater than that of the layers of first material and second material and less than or equal to that of the sacrificial layer; and then etching the sacrificial layer by the etching agent, the etching being carried out to eliminate at least partially the sacrificial layer and then to eliminate at least partially the species.
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申请公布号 |
US8541313(B2) |
申请公布日期 |
2013.09.24 |
申请号 |
US20060090212 |
申请日期 |
2006.10.25 |
申请人 |
BOREL STEPHAN;BILDE JEREMY;COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
BOREL STEPHAN;BILDE JEREMY |
分类号 |
B81C1/00;B81B7/00;B81C3/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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