| 摘要 |
Provided are: an acrylic ester derivative that is useful as a starting material of a macromolecule compound for a resist composition forming a resist pattern having a favorable shape and having superior lithography properties; an intermediate of the acrylic ester derivative (alcohol derivative); and a method for producing the acrylic ester derivative and the intermediate of the acrylic ester derivative. Specifically, provided is the acrylic ester derivative indicated by the belowmentioned general formula. (In the formula: R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; and R2, R3, R5, R7, R8, R9, and R10 each independently represents a hydrogen atom, an alkyl group having 1-6 carbon atoms, a cycloalkyl group having 3-6 carbon atoms, or an alkoxy group having 1-6 carbon atoms. R4 and R6 each independently represent a hydrogen atom, an alkyl group having 1-6 carbon atoms, a cycloalkyl group having 3-6 carbon atoms, or an alkoxy group having 1-6 carbon atoms, or R4 and R6 are both bonded and represent an alkylene group having 1-3 carbon atoms, -O-, or -S-. R11 represents a hydrogen atom, an alkyl group having 1-6 carbon atoms, or a cyclic hydrocarbon group having 3-10 carbon atoms.) |
