| 摘要 |
A chemical vapor deposition (CVD) apparatus includes at least one susceptor mounted in a non-horizontal position, and at least one holder rotatably mounted on a first surface of the susceptor for holding wafers. The holder may be rotatable around a holder axis. A showerhead may be mounted at or near a center of the susceptor. The showerhead may release a reaction gas that flows radially toward a periphery of the susceptor. The holder may have a mass center that is eccentric from the holder axis to allow movement relative to the susceptor when the susceptor rotates.
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