发明名称 SPUTTERING TARGETS AND ASSOCIATED SPUTTERING METHODS FOR FORMING HERMETIC BARRIER LAYERS
摘要 A sputtering target comprises a low Tg glass or an oxide of copper or tin. Such target materials can be used to form mechanically-stable thin films that exhibit a self-passivating phenomenon and which can be used to seal sensitive workpieces from exposure to air or moisture. Low Tg glass materials may include phosphate glasses such as tin phosphates and tin fluorophosphates, borate glasses, tellurite glasses and chalcogenide glasses, as well as combinations thereof.
申请公布号 US2013240351(A1) 申请公布日期 2013.09.19
申请号 US201313799611 申请日期 2013.03.13
申请人 CORNING INCORPORATED 发明人 AITKEN BRUCE GARDINER;KOVAL SHARI ELIZABETH;QUESADA MARK ALEJANDRO
分类号 C23C14/10 主分类号 C23C14/10
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