APPARATUS FOR CLEANING SUBSTRATE

摘要

An apparatus for cleaning a substrate includes a suction unit generating a suction force, a suction head suctioning contamination particles remaining on the substrate that is transferred in a first direction by using the suction force, and a suction tube connected to the suction unit and the suction head so as to transfer the suction force into the suction head and providing the contamination particles suctioned by the suction head into the suction unit. The suction head may include: a plurality of suction regions arranged in a second direction crossing the first direction; and a plurality of shutters for opening and closing the suction regions. The suction regions corresponding to a width of the substrate in the second direction are opened by the shutters so as to suction the contamination particles.

主权项

1. An apparatus for cleaning a substrate, the apparatus comprising:
a suction unit generating a suction force; a suction head suctioning contamination particles remaining on the substrate that is transferred in a first direction by using the suction force; and a suction tube connected to the suction unit and the suction head so as to transfer the suction force into the suction head, and providing the contamination particles suctioned by the suction head into the suction unit; wherein the suction head comprises: a plurality of suction regions arranged in a second direction crossing the first direction; and a plurality of shutters for opening and closing the suction regions; wherein the suction regions corresponding to a width of the substrate in the second direction are opened by the shutters so as to suction the contamination particles.