发明名称 |
METHOD FOR PRODUCING OPTICAL SEMICONDUCTOR DEVICE |
摘要 |
A method for producing an optical semiconductor device includes the steps of forming a semiconductor structure; forming a mask on the semiconductor structure; etching the semiconductor structure with the mask to form first and second stripe-shaped grooves and a mesa portion; forming a protective film on a top surface and side surfaces of the mesa portion; forming a resin portion on the protective film; etching the resin portion and the protective film formed on the top surface; forming an upper electrode on the top surface; and forming an electrical interconnection on the resin portion. The resin portion has an inclined surface region that rises from a first point above the mesa portion toward a second point above the first stripe-shaped groove. The step of etching the resin portion and the protective film includes the substeps of etching the resin portion and simultaneously etching the resin portion and the protective film.
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申请公布号 |
US2013244363(A1) |
申请公布日期 |
2013.09.19 |
申请号 |
US201313787883 |
申请日期 |
2013.03.07 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
YONEDA YOSHIHIRO;KOBAYASHI HIROHIKO;MASUYAMA RYUJI |
分类号 |
H01S5/028;H01S5/30 |
主分类号 |
H01S5/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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