发明名称 SILVER PLATING MATERIAL
摘要 <p>A silver plating material having a silver plating film having a thickness of no more than 10 µm formed upon a raw material comprising copper or a copper alloy. The arithmetic average roughness (Ra) of the surface of the silver plating film is no more than 0.1 µm, and the {111} orientation ratio of the silver plating film is at least 35%.</p>
申请公布号 WO2013137121(A1) 申请公布日期 2013.09.19
申请号 WO2013JP56380 申请日期 2013.03.01
申请人 DOWA METALTECH CO., LTD. 发明人 SHINOHARA, KEISUKE;OGATA, MASAFUMI;MIYAZAWA, HIROSHI
分类号 C25D7/00;H01H1/025;H01H1/04;H01R13/03 主分类号 C25D7/00
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