发明名称 NOR TYPE FLASH MEMORY CELL AND ITS STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a NOR type flash memory cell in which FN efficiency and charge trapping efficiency can be improved.SOLUTION: A NOR type flash memory cell 300 includes a first transistor M1, a second transistor M2, and a third transistor M3. The first transistor includes a control terminal, a first terminal, and a second terminal. The control terminal is used for receiving a word line signal WL, and the first terminal is used for receiving a bit line signal BL. A gate of the first transistor includes a silicon rich nitride layer and an oxide layer. The silicon rich nitride layer is embedded in the oxide layer. The control terminal of the second transistor is used for receiving a reading signal. The second terminal is used for transferring a source line signal SL, on the basis of the read signal. A third transistor is connected between the first transistor and a bit line in which the bit-line signal flows, and the control terminal receives an intermediate control signal.
申请公布号 JP2013187467(A) 申请公布日期 2013.09.19
申请号 JP20120053111 申请日期 2012.03.09
申请人 EMEMORY TECHNOLOGY INC 发明人 WU MENG-YI;YO SEISHO
分类号 H01L21/336;G11C16/04;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/336
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