发明名称 Methods and Apparatus for Direct Connections to Through Vias
摘要 Methods and apparatus for direct connection to a through via. An apparatus includes a substrate having a front side surface and a back side surface; conductive through vias formed in the substrate and having through via protrusions extending from the back side surface; solder connectors on another device and coupling the another device to the substrate, wherein the solder connectors correspond to the through via protrusions and enclose the through via protrusions to form solder joints; and connectors on the front side surface of the substrate for forming additional electrical connections. Methods include providing a substrate with through vias; thinning the substrate; etching the substrate to create through via protrusions; aligning another device with solder connectors on a surface corresponding to the through via protrusions; placing the solder connectors in contact with the protrusions; and performing a thermal reflow to form solder joints around the through via protrusions.
申请公布号 US2013241057(A1) 申请公布日期 2013.09.19
申请号 US201213420369 申请日期 2012.03.14
申请人 YU CHEN-HUA;HU YU-HSIANG;CHIOU WEN-CHIH;CHIU SAO-LING;TAI SHIH-PENG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 YU CHEN-HUA;HU YU-HSIANG;CHIOU WEN-CHIH;CHIU SAO-LING;TAI SHIH-PENG
分类号 H01L23/48;H01L21/60 主分类号 H01L23/48
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