发明名称 A SIX-MIRROR EUV PROJECTION SYSTEM WITH LOW INCIDENCE ANGLES
摘要 The invention relates to projection system for guiding light with wavelengths ‰¤ 193 nm, from an object plane to an image plane, comprising at least a first mirror, a second mirror, a third mirror, a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror centered around an optical axis (HA) and arranged along the optical axis, with the light traveling form the object plane to the first mirror, then from the first mirror to the second mirror, then from the second mirror to the third mirror, then from the third mirror to the fourth mirror, then form the fourth mirror to the fifth mirror and then form the fifth mirror to the the sixth mirror , characterized in that the third mirror, the fourth mirror and the sixth mirror are arranged along the optical axis geometrically between the first mirror and the second mirror.
申请公布号 KR101309880(B1) 申请公布日期 2013.09.17
申请号 KR20077026972 申请日期 2006.05.10
申请人 发明人
分类号 G02B17/06;G03B21/28;G03F7/20 主分类号 G02B17/06
代理机构 代理人
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