| 摘要 |
PURPOSE: A forming method of a metal thin film is provided to quickly and economically form various metal thin films by using a solution which contains one or more selected from metallic particles or ions and polymer mixture. CONSTITUTION: A forming method of a metal thin film comprises: a step of surface-treating a substrate(S100) by spreading a reductant on the surface of a substrate; and a step of forming a thin film by reducing the metal ions by the redactors by contacting a metal ion-containing solution and the surface-treated substrate. The surface treatment is forming a reducer pattern by spreading the reducer on a mold with a formed pattern, and transcribing the reducer pattern on the surface of the reductant. The contact of the metal-ion containing solution and the surface-treated substrate comprises a step of transcribing the metal ion-containing solution pattern on the mold. [Reference numerals] (S100) Surface-treating a substrate by spreading a reductant on the surface of the substrate; (S200) Forming a metal film by making the surface-treated substrate contact with a metal ion-containing solution to reduce metal ion by a reductant |
