| 摘要 |
PROBLEM TO BE SOLVED: To provide a device manufacturing method capable of suppressing transfer unevenness on a material transferred by a laser transfer method.SOLUTION: In a device manufacturing method, a barrier wall for dividing a region into a plurality of sections and a photothermal conversion layer are provided on one side of a support substrate 11. A transfer donor substrate 10 on which transfer materials 14a-14c are arranged in respective sections is irradiated with laser beam so that the transfer materials 14a-14c are transferred onto a device substrate 20. It includes a step in which the transfer materials 14a-14c of the transfer donor substrate 10 are made to face a transfer surface 20a of the device substrate 20, so that a barrier wall 13 abuts with the device substrate 20, a step in which a presser plate 30 through which laser beam penetrates is arranged on a rear surface side of the support substrate 11, and a step in which laser beam is radiated to the rear surface side through the presser plate 30. In at least regions corresponding to a plurality of sections, a gap having at least the length five times the wavelength of laser beam is provided between the presser plate 30 and the support substrate 11. |
