发明名称 POROUS SEMICONDUCTOR ELECTRODE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide: a porous semiconductor electrode that enables a porous semiconductor thin film to have a constant film thickness without depending on viscosity control; and a method of manufacturing the porous semiconductor electrode.SOLUTION: In order to manufacture a porous semiconductor electrode 13 by forming a porous semiconductor thin film 12 on a surface of a porous semiconductor substrate 11 having fine pores extending through the front and rear thereof, a pressurized fluid G is brought into contact with the rear surface of the substrate 11 so that the pressure in the fine pores becomes higher than that in the atmosphere on the surface of the substrate 11 so as to increase the pressure in the fine pores. In this state, porous semiconductor slurry S that becomes the thin film 12 is applied to the surface of the substrate 11.
申请公布号 JP2013182671(A) 申请公布日期 2013.09.12
申请号 JP20120043553 申请日期 2012.02.29
申请人 NIPPON STEEL & SUMIKIN ENGINEERING CO LTD;NIPPON STEEL & SUMIKIN CHEMICAL CO LTD 发明人 HIROSE KEISUKE;HANADA KAZUMI;KONO MITSURU;FUJITAKA TOSHIHISA
分类号 H01M14/00;H01L31/04 主分类号 H01M14/00
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