| 摘要 |
The method includes: measuring a first wavefront of a reference light on a sensor by using the sensor; calculating a second wavefront of the reference light on the sensor by using a parameter of an optical system; changing an optical system parameter in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller; calculating, by using the changed parameter, a magnification distribution of rays of the reference light between on the sensor and on a sensor conjugate surface; measuring a first ray angle distribution of the reference light by using the sensor, and measuring a second ray angle distribution of a measurement light by using the light-receiving sensor. The method calculates the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the first and second ray angle distributions and the magnification distribution.
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